Article L622-1

The final or intermediate topography of a semiconductor product that is the result of its creator's own intellectual effort may, unless it is commonplace, be the subject of a deposit that confers the protection provided for in this Chapter.

Such deposit may not, however, occur either more than two years after the topography has first been exploited commercially anywhere, or more than 15 years after it was first fixed or encoded where it has never been exploited.

Any deposit that does not meet the conditions specificied in this Article shall be null and void.

Cabinet Chaillot